Modeling of plating process in view of geometrical configurations of electrodes

Authors

  • Aleksey Germanovich Lyutov
  • Aliya Rifovna Ishkulova

Keywords:

Electroplating, Laplace equation, the geometric  configuration of the electrodes, the potential distribution  and thickness of the coating

Abstract

 The article stated and solved the problem of calculating the potential distribution in the plating baths. Developed a mathematical model that takes into account the  electrochemical and geometric factors  affecting  the  uniformity of  the coating  thickness on the  surface  of  the  cathode. The results of the  calculation of the  potential distribution and thickness of the coating. 

Published

2018-02-07

Issue

Section

MECHANICAL ENGINEERING AND ENGINEERING SCIENCE