Formation of an intermediate Mo-Zr alloy using by low-energy high-current electron beam

Abstract

The paper presents the results of a study of the Cr-Mo-Zr system in two modes. Mode 1 was obtainedby layer-by-layer deposition of Mo and Cr films on a Zr substrate. Mode 2 was obtained by alternatingthe operations of sputtering a Mo film onto the substrate and electron beam processing, followed bydeposition of an external Cr film. Using scanning electron microscopy (SEM) methods on the crosssection of the samples, it was shown that the thickness of the intermediate Mo layer in mode 1 is~1 μm. While the formation of an intermediate Mo-Zr alloy leads to the presence of Mo at a depth ofup to ~4 μm. It is assumed that this is due to the lifetime of the sublayer in the molten state, which,together with the high temperature, promotes intensive mass transfer processes of both the Mo layerinto the substrate and the Zr substrate to the surface. Regions enriched in Mo were also found in thealloy. The formation of an intermediate Mo-Zr alloy using a low-energy high-current electron beam(LEHCEB) leads to a change in surface morphology with the presence of defects in the form of singlecracks. It is assumed that such defects are caused by the relaxation of internal stresses during theformation of the alloy by an electron beam.